
Molecular beam epitaxy
Last updated: September 16, 2009.
Growing crystals is easy. Fill a plastic bottle almost to the top
with cold water and place it in a freezer for a couple of hours. Take
it out again at just the right time and the water will still be a
liquid but, if you tilt the bottle very gently, it will snap into an
amazing snow forest of ice crystals right before your eyes! Growing
single crystals for scientific or industrial use in such things as
integrated circuits is somewhat harder
because you need to combine atoms of
different chemical elements much more precisely. At the opposite end
of the spectrum from growing random ice crystals in your freezer, one
of the most exacting methods of making a crystal is a technique called
molecular beam epitaxy (MBE). It sounds horribly complex, but
it's fairly easy to understand. Let's take a closer look!
Photo: Molecular beam epitaxy (MBE) being used to make
photovoltaic solar cells: You can see the beams around the edge that fire molecules onto the substrate in the center. Photo by Jim Yost courtesy of US DOE/NREL (U.S. Department of Energy/National Renewable Energy Laboratory).
What is molecular beam epitaxy?

To make an interesting new crystal using MBE, you start off with
a base material called a substrate, which could be a familiar
semiconductor material such as silicon, germanium, or gallium
arsenide. Then you fire relatively precise beams of atoms or
molecules (heated up so they're in gas form) at the substrate from
"guns" called effusion cells. You need one "gun" for each
different beam, shooting a different kind of atom or molecule at the
substrate, depending on the nature of the crystal you're trying to
create. The added atoms or molecules land on the surface of the
substrate, condense, and build up very slowly and systematically in
ultra-thin layers, so the complex, single crystal you're after grows
one atomic layer at a time. That's why MBE is an example of what's
called thin-film deposition. Since it involves building up
materials by manipulating atoms and molecules, it's also a perfect
example of what we mean by nanotechnology.
Photo: Molecular beam epitaxy (MBE) in action. Photo by Jim Yost courtesy of
US DOE/NREL (U.S. Department of Energy/National Renewable Energy Laboratory).
That's pretty much MBE in a nutshell. If you want a really simply
analogy, it's a little bit like the way an inkjet printer makes
layers of colored print on a page by firing jets of ink from hot
guns. In an inkjet printer, you have four separate guns firing
different colored inks (one for cyan ink, one for magneta, one for yellow, and one for black),
which slowly build up a complex colored image on the paper. In MBE, separate beams fire
different atoms or molecules and they build up on the surface of the
substrate, albeit more slowly than in inkjet printing—MBE can take
hours! Epitaxially simply means "arranged on top of," so all
molecular beam epitaxy really means is using beams of atoms or
molecules to build up layers on top of a substrate.

Photo: Molecular beam epitaxy (MBE) means creating a single crystal by building up orderly layers of atoms on top of a substrate (base layer).
Why would you use molecular beam epitaxy?
You might want to create a semiconductor laser for a
CD player, or an advanced computer chip, or a
low-temperature superconductor. Or maybe
you want to build a solar-cell by depositing a thin film of a
photovoltaic
material (something that creates electricity when
light falls on it) onto a substrate. In short, if you're designing a really
precise thin-film device for computing, optics, or photonics (using
light beams to carry and process signals in a similar way to
electronics), MBE is one of the techniques you'll probably consider
using. Apart from industrial processes, it's also used in all kinds
of advanced nanotechnology research.
Who invented molecular beam epitaxy?
The basic MBE technique was developed around 1968 at Bell
Laboratories by two American physicists, Chinese-born Alfred Y. Cho
and John R. Arthur, Jr. Important contributions were also made by
other scientists, such as Japanese-born physicist Leo Esaki (who won
the 1973 Nobel Prize in Physics for his work on semiconductor
electronics) and Ray Tsu, working at IBM. Since then, many other
researchers have developed and refined the process.